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First adhesive wafer bonding with ultra thin intermediate layers on 100 mm wafers. Sub200 nm adhesive bonding layers are presented. Less than & 177;10% non uniformity of the intermediate layer thickness. >99% bonding yield and high bond strength of 4.8 MPa were achieved.

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By adding a sacrificial layer and a carrying silk layer, the ultra thin MIM color absorber can be transferred to any arbitrary substrate. As a proof of concept experiment, the ultra thin MIM resonator conformed on a contact lens and a human brain model with curved and wrinkled surfaces.

Improvement of high resolution lithography by using

Finally, after the resist transfer into the capping layer, the carbon hard mask etch with trimming, and the standard hard mask Si 3 N 4 patterning, we succeed in achieving 20 nm fully depleted SOI gates .

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Aug 21, 2019 & 0183;& 32;UltraThin Atomic Layer DepositedNb 2 O 5 as Electron Transport Layer for CoEvaporated MAPbI 3 Planar Perovskite Solar Cells Anand S. Subbiah Department of Energy Science and Technology, IIT Bombay, Mumbai, 400076 India

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Ultra Thin 4 Layer Black Carbon Mask Export